Jensen Huang: China to Master Domestic Advanced Lithography by 2030

Beating AI News Flash: Jensen Huang judged at the All-In Summit that China will be able to build its own advanced lithography systems by 2030. He also believes that once the technology matures, China has strong large-scale production capacity, and it is only a matter of time before domestic equipment enters local wafer fabs.

This judgment is clearly more optimistic than Zeiss's. Frank Rohmund, head of Zeiss Semiconductor, recently said that it may still take China about 15 years to build a domestic EUV lithography machine. Zeiss is a core supplier of ASML's EUV optical systems.

However, the host asked about "advanced lithography systems," without specifically limiting it to EUV, and Jensen Huang did not further say in his answer that it was EUV.