Samsung Electronics has announced a new generation of lithography technology roadmap, which will deploy high-NA EUV in volume production at the 1nm node.

BlockBeats News, August 11th - Samsung Electronics technology expert Park Chang-min announced at the 2026 NGL Conference that Samsung Electronics plans to introduce a major innovation in lithography technology in its 1-nanometer process, which may first enter mass production as early as 2030. The company intends to deploy High NA EUV in large-scale production at the 1nm node, which is a next-generation extreme ultraviolet lithography technology currently focused on developing the technology needed for commercialization.

In addition, Samsung Electronics is also strengthening the development of High NA EUV, which is the next generation of EUV technology. The company is targeting the 1nm (or A10) process as its goal for full-scale deployment in mass production. "A" stands for angstrom, where 1 angstrom is equal to 0.1nm.

According to this roadmap, Samsung Electronics expects to begin using High NA EUV in mass production around 2030. The company has achieved the commercialization of the 2nm process and plans to start mass production of its 1.4nm SF1.4 process in 2029. It is reported that it is preparing to start mass production of SF1.4+ (an enhanced version of the 1.4nm process) as well as its 1nm process in 2030.